NB-Photonics is home to a wide variety of specialized tools and machines for processing, handling and characterizing photonic-related materials, components and systems. Many of these tools are unavailable in commercial settings. In keeping with our mission to foster innovation, NB-Photonics helps businesses access these unique tools within the respective labs.

A number of our key tools is described below, and we have access to a wider range than these listed. Let us know your specific needs.

  • Optical spectroscopy
    o Spectrophotometer (175 – 3300 nm)
    o Fourier transform infrared (FTIR) / Raman spectroscopy / micro-Raman system
    o Ultrafast absorption spectroscopy
    o Setup for thermoluminescence (TL) spectroscopic measurements with variable wavelength and low temperature excitation
    o Spectroscopic ellipsometry
  • Measurement capabilities for photonic materials, devices and systems
    o A variety of setups to characterize photonic devices, from the visible to the mid-infrared
    o Photoluminescence decay measurements with time resolution of approximately 10 ns
    o Current-Voltage-Temperature measurements (from -190 °C up to 130 °C)
    o Impedance measurements, as a function of frequency (5 Hz up to 13 MHz) and temperature (-190°C to 130 °C)
    o Setup for absolute internal and external quantum efficiency (QE) measurement of luminescent materials and quantum dots
    o Equipment, software and expertise for colour measurements and calculations of light sources and surfaces (CCT, CRI, CQS, TM-30-15, Duv, (x,y), LER)
    o Absolute surface luminance measurements, both in photopic and scotopic regime
    o Electronic measurements of photonic systems up to 67 GHz in the time and frequency domain
    o Bit error rate testing of photonic systems up to 50 Gb/s
    o Arbitrary waveform generation for photonic systems up to 65 Gb/s
  • 3D profilometer
  • Microscopy (excluding microscopy for cell and tissue imaging)
    o Atomic force microscope
    o Interfacial force microscope (IFM) scanning probe
    o Ballistic electron emission microscope for surfaces, interfaces, etc including at low temperatures
    o Scanning electron microscope (SEM) with elemental analysis (EDX), spectroscopy cathodoluminescence (CL) detection and temperature stage
    o Field emission gun (FEG) environmental SEM
    o Confocal and microfluid microscope in combination with optical trapping
    o Raman microscope
  • Dual-beam focused ion and electron beam writer for prototyping and advanced characterization of optical/photonic devices
  • Liquid crystal device assembly equipment
  • Colloidal quantum dot synthesis lab
  • Rapid thermal processor for gases including Ar, N2, O2, H2, NH3, HCl
  • Thin film deposition system with glove box for OLED & OPV fabrication
  • Langmuir-Blodgett deposition system
  • Deposition vacuum chamber for metallization via various means: thermal evaporation, D.C. and R.C. magnetron sputtering, e-gun evaporation, and substrate heating
  • Cleanroom access to processing facilities for fabricating photonic devices and other materials
  • Robotic positioning of materials
  • Ultraviolet laser with long coherence length for writing holographic gratings
  • 3-laser system for ablation of diverse materials e.g. organic films, CU-films, microlenses, resists
  • Various low power CW and pulsed diode laser with wavelengths from the near-UV to the near-IR.
  • Multiline tunable CW argon ion laser
  • CW tunable Ti-Saph laser for the 750 – 950 nm wavelength range
  • Tunable external cavity diode laser in the 890 – 910 nm range
  • Several tunable laser instruments for the major telecom bands (1300 nm and 1550 nm)
  • High Power CW laser (in fact cw OPO) going from 1500 – 3800 nm with a gap from 1950 – 2250 nm. It gives more than 1 W in this whole band
  • Moderately low power (100 mW) Quantum cascade laser working in a band around 5200 nm
  • High power CW laser lasing from 2050 nm up to 2500 nm
  • Low power (topica laser) in a band around 1680 – 1730 nm
  • Several broadband LEDs at 1310 nm, 1550 nm and 1650 nm
  • High peak power pulsed laser at 1064 nm: 1 ns, 10 kW peak power (1 kHz rep rate)
  • Femtosecond laser with peak power of 10 kW giving pulses between 80 – 300 fs at 1550 nm (10 MHz rep rate)
  • Picosecond laser with peak power of 1 W giving pulses of a few ps at 10 GHz at 1550 nm
  • CO2 laser (GSIL Impact SSM 2150) with 10.6 micron wavelength
  • Nd-YAG laser (LWE 210-355-5000) with 355 nm wavelength
  • KrF Excimer laser (ATL Lasertechnik SP300i) with 248 nm wavelength
  • Picosecond laser (TimeBandwidth Duetto) with 355 nm, 532 nm, and 1064 nm wavelength
  • Femtosecond laser (Amplitude Systems, Satsuma), with 1030 nm wavelength
  • CW single mode optically pumped semiconductor laser (Coherent, Genesis CX STM-Series) with 355 nm wavelength
  • Mai Tai HP: Modelocked femtosecond laser, which is tunable in the 690 – 1040 nm range, and average power at 800 nm >2.5 W with pulse width of 120 fs and repetition rate of 80 MHz (pulsepicker available to reduce the repetition rate if needed). A frequency doubler for Mai Tai is available to extend the range of available wavelengths to the blue range
  • SpitFire Ace regenerative amplifier, which produces 4 mJ femtosecond pulses (120 fs pulse width) at a repetition rate of 1 kHz and a (fixed) wavelength of 800 nm
  • TOPAS Prime optical parametric amplifier (OPA): produced femtosecond pulses (120 fs pulse width) with a tunable wavelength in the range 290 – 2600 nm at a repetition rate of 1 kHz.